| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive composition capable of improving lithographic characteristics while maintaining high electrical characteristics in the formation of an insulating film, and to provide a method for forming an insulating film pattern using the same.SOLUTION: The photosensitive composition for forming an insulating film contains a silsesquioxane resin (A), an acid generator component (B) which generates an acid upon exposure, and a crosslinking agent component (C). The silsesquioxane resin (A) has a constituent unit (a1) containing a phenolic hydroxyl group and a constituent unit (a2) containing an alkyl group. The acid generator component (B) contains an acid generator (B1) comprising an onium salt which has only one aromatic ring or does not have an aromatic ring in its cationic moiety.SELECTED DRAWING: None |
