发明名称 Method and apparatus for growing high purity single crystal silicon carbide
摘要 Method and apparatus for growing semiconductor grade silicon carbide boules (84). Pure silicon feedstock (36) is melted and vaporized. The vaporized silicon is reacted with a high purity carbon-containing gas (64), such as propane, and the gaseous species resulting from the reaction are deposited on a silicon carbide seed crystal (50), resulting in the growth of monocrystalline silicon carbide.
申请公布号 US5985024(A) 申请公布日期 1999.11.16
申请号 US19970987572 申请日期 1997.12.11
申请人 NORTHROP GRUMMAN CORPORATION 发明人 BALAKRISHNA, VIJAY;THOMAS, R. NOEL;AUGUSTINE, GODFREY;HOPKINS, RICHARD H.;HOBGOOD, H. MCDONALD
分类号 C30B29/36;C30B23/00;C30B23/02;(IPC1-7):C30B23/00 主分类号 C30B29/36
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