发明名称 Gray scale etching for thin flexible interposer
摘要 Disclosed is a sculpted probe pad and a gray scale etching process for making arrays of such probe pads on a thin flexible interposer for testing the electrical integrity of microelectronic devices at terminal metallurgy. Also used in the etching process is a novel fixture for holding the substrate and a novel mask for 1-step photolithographic exposure. The result of the invention is an array of test probes of preselected uniform topography, which make ohmic contact at all points to be tested simultaneously and nondestructively.
申请公布号 US6156484(A) 申请公布日期 2000.12.05
申请号 US19980021758 申请日期 1998.02.11
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BASSOUS, ERNEST;DAS, GOBINDA;EGITTO, FRANK DANIEL;FEILCHENFELD, NATALIE BARBARA;FOSTER, ELIZABETH F.;FUERNISS, STEPHEN JOSEPH;KAMPERMAN, JAMES STEVEN;MIKALSEN, DONALD JOSEPH;SCHEUERMANN, MICHAEL ROY;STONE, DAVID BRIAN
分类号 G01R1/067;G01R3/00;(IPC1-7):G03F7/00 主分类号 G01R1/067
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