发明名称 Lithographic apparatus and device manufacturing method
摘要 <p>One or more programmable patterning means are mounted to a mounting plate via height adjustment structures that enable the flatness of the active surfaces of the patterning means to be controlled. The height adjustment structures may comprise an array of piezoelectric actuators or screws. Alternatively, the backside of the patterning means may be polished to optical flatness and bonded by crystal bonding to an optically flat surface of a rigid mounting body. &lt;IMAGE&gt;</p>
申请公布号 EP1517188(A2) 申请公布日期 2005.03.23
申请号 EP20040255638 申请日期 2004.09.16
申请人 ASML NETHERLANDS B.V.;ASML HOLDINGS N.V. 发明人 BLEEKER, ARNO JAN;FRANKEN, DOMINICUS JACOBUS PETRUS ADRIANUS;KOCHERSPERGER, PETER C.;TROOST, KARS ZEGER
分类号 G03F7/20;(IPC1-7):G03F7/20 主分类号 G03F7/20
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