| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a gas barrier film which has a high gas barrier property, and excellent flexibility and adhesiveness.SOLUTION: A manufacturing method of a gas barrier film, which has an inorganic layer [A] and a silicon compound layer [B] formed from a polymer base material side in this order on at least one side of the polymer base material, includes a process of forming the silicon compound layer [B], wherein the process sequentially has a process [a] of forming a coating film by coating with a coating liquid containing a silicon compound having a polysilazane skeleton, a process [b] of drying the coating film, a process [c] of humidifying the coating film, and a process [d] of conducting active energy beam irradiation to the coating film.SELECTED DRAWING: Figure 1 |
