| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemically amplified positive resist composition excellent in environment property, having proper sensitivity with respect to energy rays, and capable of forming a high resolution resist pattern of a refined shape. <P>SOLUTION: The chemically amplified positive resist composition contains an acid generator (A), represented by Formula (1) and a polymer (B) having an acid-labile group, wherein R<SP>01</SP>-R<SP>06</SP>each independently represents H or a substituent; R<SP>31</SP>represents a substituent; R<SP>11</SP>and R<SP>12</SP>each independently represents H or a substituent; and R<SP>21</SP>and R<SP>22</SP>each independently represents a substituent. <P>COPYRIGHT: (C)2007,JPO&INPIT |
