| 发明名称 | Test pattern for feature cross-sectioning | ||
| 摘要 | A method includes forming a first plurality of instances of a first pattern on a substrate. The first pattern includes a plurality of features defining a first spacing between features in a first direction. The instances in the first plurality are offset from one another at least in a second direction other than the first direction. The substrate is cleaved along a cleavage line. At least a first critical dimension of a feature in the first plurality of instances intersected by the cleavage line is measured. | ||
| 申请公布号 | US9397012(B2) | 申请公布日期 | 2016.07.19 |
| 申请号 | US201414316915 | 申请日期 | 2014.06.27 |
| 申请人 | GLOBALFOUNDRIES Inc. | 发明人 | Civay Deniz E.;Schlief Ralph |
| 分类号 | H01L21/8242;H01L21/66;H01L21/78;G01B11/00;G03F1/44 | 主分类号 | H01L21/8242 |
| 代理机构 | Amerson Law Firm, PLLC | 代理人 | Amerson Law Firm, PLLC |
| 主权项 | 1. A method, comprising: forming a first plurality of instances of a first pattern on a substrate, said first pattern including a plurality of features defining a first spacing between features in a first direction, wherein said instances in said first plurality are offset from one another at least in a second direction other than said first direction; cleaving said substrate along a cleavage line; and measuring at least a first critical dimension of a feature in said first plurality of instances intersected by said cleavage line. | ||
| 地址 | Grand Cayman KY | ||