发明名称 Self-aligned semiconductor contact structures and methods for fabricating the same
摘要 A self-aligned contact structure and a method of forming the same include selected neighboring gate electrodes with adjacent sidewalls that are configured to angle toward each other. The angled surfaces of the gate electrodes can be protected using a liner layer that can extend the length of the contact window to define the sidewalls of the contact window.
申请公布号 US2006192255(A1) 申请公布日期 2006.08.31
申请号 US20060396819 申请日期 2006.04.03
申请人 KIM SEONG-HO;PARK DONG-GUN;LEE CHANG-SUB;CHOE JEONG-DONG;KIM SUNG-MIN;LEE SHIN-AE 发明人 KIM SEONG-HO;PARK DONG-GUN;LEE CHANG-SUB;CHOE JEONG-DONG;KIM SUNG-MIN;LEE SHIN-AE
分类号 H01L29/76;H01L21/28;H01L21/336;H01L21/60;H01L21/768;H01L21/8234;H01L21/8242;H01L27/088;H01L27/10;H01L27/108;H01L29/423;H01L29/49;H01L29/78 主分类号 H01L29/76
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