| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a holding pad reduced in wear and improved in holding capacity of a polishing object. <P>SOLUTION: The holding pad 10 has a foam sheet 2 formed of urethane resin. The foam sheet 2 has a sequential foaming structure formed by a wet deposition method. The foam sheet 2 contains carbon black 5 of 5 wt.% or less and colloidal silica 4 in a range of 1-5 wt.% respectively with respect to the weight of the foam sheet 2 approximately uniformly and equally in a base material. An average particle diameter of the colloidal silica 4 is limited within a range of 10-100 nm. Both the carbon black 5 and the colloidal silica 4 serve to keep the foaming shape of the foam sheet 2, so as to secure stability in the foaming shape of the foam sheet 2. <P>COPYRIGHT: (C)2011,JPO&INPIT |
