发明名称 Method for monitoring film thickness using heterodyne reflectometry and grating interferometry
摘要 A linearly polarized light comprised of two linearly polarized components, orthogonal to each other and with split optical frequencies, is directed toward a film. A detector receives the beam prior to incidence on the film layer and generates a reference signal. The reflected beam is diffracted into zeroth- and first-order bands, which are then detected by separate detectors; a measurement signal is generated from the zeroth-order beam and a grating signal from the first-order beam. The zeroth-order beam's measurement signal and reference signal are analyzed by a phase detector for a heterodyne phase shift, and an accurate film thickness calculated from this phase shift by knowing a refractive index for the film. Additionally, the zeroth-order beam measurement signal is analyzed with the grating signal by a phase detector for detecting a grating phase shift induced by the grating. The refractive index for the film can then be calculated directly from grating phase shift and the heterodyne phase shift for the grating pitch, and the beam's wavelength and incidence angle on the film of the measurement apparatus. Using the refractive index and heterodyne phase shift, the film's thickness is determined for the apparatus. Conversely, the thickness of the film can be calculated independent of the refractive index, and without knowing the film's refractive index, directly from the grating phase shift and the heterodyne phase shift for the apparatus.
申请公布号 US2006285120(A1) 申请公布日期 2006.12.21
申请号 US20050178856 申请日期 2005.07.10
申请人 VERITY INSTRUMENTS, INC. 发明人 AIYER ARUN A.
分类号 G01B9/02;G01B11/02 主分类号 G01B9/02
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