发明名称 DIAMOND FILM DEPOSITION
摘要 <p>Diamond material made by a hot filament chemical vapor deposition process, providing large film area, good growth rate, phase purity, small average grain size, smooth surfaces, and other useful properties. Low substrate temperatures can be used. Control of process variables such as pressure and filament temperature and reactant ratio allow control of the diamond properties. Applications include MEMS, wear resistance low friction coatings, biosensors, and electronics.</p>
申请公布号 KR20100035161(A) 申请公布日期 2010.04.02
申请号 KR20107000405 申请日期 2008.07.09
申请人 ADVANCED DIAMOND TECHNOLOGIES, INC. 发明人 CARLISLE JOHN A.;WEST CHARLES;ZIMMER JERRY
分类号 C23C16/27;C23C16/46 主分类号 C23C16/27
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