MICRO PATTERN FORMATION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method in which, under the single condition of a low temperature/low pressure/short time period, micro patterns of the order of nanometer to micrometer at a high aspect ratio are in a lump formed. SOLUTION: This micro pattern formation method contains the steps of: coating a patterning material containing polysilane and a silicon compound on a substrate; connecting a mold formed with the predetermined micro pattern with the coated patterning material by insulation displacement; irradiating an energy line from the substrate side in a state that the mold is connected with the patterning material by insulation displacement; releasing the mold; and irradiating the energy line from the side in which the mold is connected with the patterning material by insulation displacement. COPYRIGHT: (C)2008,JPO&INPIT