发明名称 |
SPECTRAL PURITY FILTER, RADIATION SOURCE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD |
摘要 |
According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20μm. |
申请公布号 |
KR20110039457(A) |
申请公布日期 |
2011.04.18 |
申请号 |
KR20117003201 |
申请日期 |
2009.07.09 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JAK MARTIN JACOBUS JOHAN;SOER WOUTER ANTHON;VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS;BANINE VADIM YEVGENYEVICH;YAKUNIN ANDREI MIKHAILOVICH |
分类号 |
G03F7/20;G02B5/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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