| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a laminated polishing pad for polishing with excellent polishing performance such as flatness and smoothness, and excellent durability for long-term polishing. <P>SOLUTION: The laminated polishing pad for polishing is a fabric having a polishing layer composed of warp threads and weft threads. The laminated polishing pad for polishing includes a multi-filament high twisted yarn fabric whose twist number is 1,500-4,000 T/m, and a support body whose Asker A hardness is 60 or higher. <P>COPYRIGHT: (C)2011,JPO&INPIT |
