CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a charged particle beam lithography apparatus capable of reducing deterioration of a measurement accuracy of a stage position.SOLUTION: A charged particle beam lithography apparatus comprises: a drawing chamber 2a that has a bottom plate 51b including a bending part 51b2 that bends toward an external part and a plurality of supporting parts 51b1 arranged in an outer periphery of the bending part 51b2; a stage 11 that is arranged in the drawing chamber 2a and to which a sample W is mounted; a stage moving mechanism 12 that is supported by each supporting part 51b1 in the drawing chamber 2a and moves the stage 11; a two-dimensional scale 13a that is arranged on a lower surface of the stage 11; an encoder head 13b that is arranged at a lower side of the two-dimensional scale 13a and detects a position of the stage 11 by the two-dimensional scale 13a; and a supporting medium 55 that has a plurality of end parts 55b1 attached to the supporting part 51b1 and supports the encoder head 13b so as to over the bending part 51b2.SELECTED DRAWING: Figure 2