发明名称 SULFONIUM SALT AND PREPARATION METHOD THEREOF
摘要 <p>PURPOSE: New sulfonium salt and method for manufacturing it by reacting sulfoxide compound with aromatic compound by using perfluroalkaneesufonic anhydride without using Grignard's reagent are provided which are useful as a photo acid generator in a chemical amplification-type photoresist using a semiconductor material. CONSTITUTION: The compound(I) is manufactured. In (I) Ra,Rb,Rc are independently alkyl, aryl, allyl. For an example, 1g phenyl sulfoxide is dissolved in 50ml toluene, added with 1.48g triflic anhydride slowly and agitated for 1 hr. Sulfonium salt is extracted from the reaction mixture by using distilled water and then toluene and reactant are removed. Extracted sulfonium is reextracted by using dichloromethane and then dichloromethane is removed from the solution by distilling under reduced pressure and the solution is added with ether to give 2.06g sulfonium salt(yield:96%), which comprises diphenyl(2-methylphenyl)sulfonium triflate and diphenyl(4-methylphenyl)sulfonium triflate in a ratio of 18/82. The compound is useful for a photo acid initiator in a polymerization or a radical photoinitiator and a photo acid generator for eliminating a protecting group of organic compound.</p>
申请公布号 KR20000008811(A) 申请公布日期 2000.02.15
申请号 KR19980028833 申请日期 1998.07.16
申请人 KOREA KUMHO PETROCHEMICAL CO.,LTD 发明人 PARK, JU HYEON;SEO, DONG CHEOL;PARK, SEON I;KIM, SEONG JU
分类号 C07C381/00;C07C309/06;C07C381/12;G03F7/004;G03F7/029;(IPC1-7):C07C381/00 主分类号 C07C381/00
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