| 摘要 |
PROBLEM TO BE SOLVED: To provide a processed fabric for cleaning, which is suitably used for cleaning a surface of a substrate for a magnetic recording medium, particularly provide a processed fabric for cleaning, which is suitably used for efficiently cleaning the surface of the substrate for the magnetic recording medium after polishing processing.SOLUTION: The processed fabric for cleaning is a sheet-like material which comprises a fiber entangled body that is mainly formed of an ultrafine fiber bundle including ultra fine fibers having an average fiber diameter of 0.3-3.0 μm, and an elastomeric polymer. The ultra fine fiber has a modified cross-section, and the sheet-like material has a coefficient of dynamic friction of 0.2-0.8. |
