发明名称 HETEROSTRUCTURE WITH STRESS CONTROLLING LAYER
摘要 A solution for fabricating a device is described. The solution can include fabricating a heterostructure for the device, which includes at least one stress controlling layer. The stress controlling layer can include one or more attributes varies as a function of a lateral position based on a target variation of stresses in a semiconductor layer located directly under the stress controlling layer. Embodiments are further directed to a heterostructure including at least one stress controlling layer and a device including the heterostructure.
申请公布号 WO2016197077(A1) 申请公布日期 2016.12.08
申请号 WO2016US35939 申请日期 2016.06.05
申请人 SENSOR ELECTRONIC TECHNOLOGY, INC. 发明人 SHUR, Michael;DOBRINSKY, Alexander
分类号 H01L33/00;H01L33/02 主分类号 H01L33/00
代理机构 代理人
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