发明名称 |
SEMICONDUCTOR STRUCTURE WITH AN L-SHAPED BOTTOM PLATE |
摘要 |
A semiconductor structure that has adjacent transistors that share a common source/drain semiconductor structure. At least one of the adjacent transistors comprising: a vertical channel and a source/drain semiconductor structure connected to the vertical channel such that the source/drain semiconductor structure has a vertical side that is substantially planar with a vertical side of the first vertical channel. The source/drain semiconductor structure extends horizontally from its vertical side farther than the first vertical channel extends from its vertical side such that a width of the source/drain is greater than a width of the first vertical channel. The first source/drain semiconductor structure is located on a layer of substrate and the vertical channel is perpendicular relative to the layer of substrate. |
申请公布号 |
US2016307892(A1) |
申请公布日期 |
2016.10.20 |
申请号 |
US201615190543 |
申请日期 |
2016.06.23 |
申请人 |
International Business Machines Corporation |
发明人 |
Cheng Kangguo;Haensch Wilfried E.;Khakifirooz Ali;Shahrjerdi Davood |
分类号 |
H01L27/088;H01L29/417;H01L29/10;H01L29/78;H01L29/08 |
主分类号 |
H01L27/088 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor structure, the semiconductor structure comprising:
adjacent transistors that share a common source/drain semiconductor structure; at least one of the adjacent transistors comprising:
a first vertical channel; anda first source/drain semiconductor structure connected to the first vertical channel such that the first source/drain semiconductor structure has a vertical side that is substantially planar with a vertical side of the first vertical channel, the first source/drain semiconductor structure extending horizontally from its vertical side farther than the first vertical channel extends from its vertical side such that a width of the source/drain is greater than a width of the first vertical channel, the first source/drain semiconductor structure being located on a layer of substrate, the vertical channel being perpendicular relative to the layer of substrate. |
地址 |
Armonk NY US |