发明名称 METHODS AND DEVICES FOR DEPOSITION OF MATERIALS ON PATTERNED SUBSTRATES
摘要 Methods for depositing materials on patterned substrates, and related devices, are generally provided. In some embodiments, a material is deposited on a patterned substrate. In certain embodiments, the substrate comprises a first portion with a material deposited on the first portion and a second portion of the substrate essentially free of the material. The methods described herein may be useful in fabricating sensors, circuits, tags, among other devices. In some cases, devices for determining analytes are also provided.
申请公布号 US2016195504(A1) 申请公布日期 2016.07.07
申请号 US201514831679 申请日期 2015.08.20
申请人 Massachusetts Institute of Technology 发明人 Swager Timothy M.;Frazier Kelvin Mitchell;Mirica Katherine A.;Walish Joseph
分类号 G01N33/00 主分类号 G01N33/00
代理机构 代理人
主权项 1. A method for fabricating a device, comprising: providing a substrate comprising a first portion and a second portion;contacting essentially identically the first portion and the second portion of the substrate with an article comprising a first material via mechanical abrasion, thereby forming the first material on the first portion while leaving the second portion essentially free of the first material, or forming the first material on the second portion in an amount at least 10% less per unit area of substrate than the first material formed on the first portion.
地址 Cambridge MA US