| 摘要 |
An exposure apparatus is equipped with a coarse movement stage which can move along an XY plane and includes a first section and a second section that can come close to and separate from each other, a fine movement stage which holds wafer W and is supported relatively movable at least within the XY plane by the coarse movement stage, and a drive system which drives the fine movement stage supported by the coarse movement stage independently or integrally with the coarse movement stage. Further, the exposure apparatus is equipped with a relay stage which can deliver the fine movement stage to/from the coarse movement stage. |
