发明名称 SUBSTRATE TREATMENT EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide an MMT apparatus capable of suppressing a temperature increase of a treatment container peripheral part. SOLUTION: An MMT (Modified Magnetron Typed) apparatus comprises a treatment container 11 having a treatment chamber 14 formed by an lower side container 12 and an upper side container 13, a susceptor 21 installed within the treatment chamber 14 for holding a wafer 1, a heater 41 for heating the wafer 1 on the susceptor 21, a shower head 26 for supplying reactive gas to the wafer 1, a cylindrical electrode 15 for exciting the reactive gas, and a cylindrical magnet 19 for generating a magnetic field. A heat shielding part 42 is installed on an outer surface of the upper side container 13. Heat rays such as infrared rays and far-infrared rays generated by irradiation from the heater and wafer can be shielded by the heat shielding part to suppress the temperature increase of the cylindrical electrode and the cylindrical magnet. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009059845(A) 申请公布日期 2009.03.19
申请号 JP20070225163 申请日期 2007.08.31
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 HAMANO MASATSUYA
分类号 H01L21/31;C23C16/44;H01L21/3065 主分类号 H01L21/31
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