发明名称 |
Charged particle beam drawing apparatus |
摘要 |
A charged particle beam drawing apparatus according to an embodiment includes; a vacuum vessel including a base plate; a stage provided in the vacuum vessel and supporting a sample; a stage movement mechanism provided in the vacuum vessel and moving the stage; a two-dimensional scale provided on a lower surface of the stage; a detection unit disposed under the two-dimensional scale and detecting a position of the stage by using the two-dimensional scale; and a support body supporting the detection unit. |
申请公布号 |
US9466465(B2) |
申请公布日期 |
2016.10.11 |
申请号 |
US201514674054 |
申请日期 |
2015.03.31 |
申请人 |
NuFlare Technology, Inc. |
发明人 |
Ideno Keita |
分类号 |
H01J37/20;H01J37/317 |
主分类号 |
H01J37/20 |
代理机构 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. A charged particle beam drawing apparatus comprising:
a vacuum vessel including a base plate; a stage provided in the vacuum vessel and supporting a sample; a stage movement mechanism provided in the vacuum vessel and moving the stage; a two-dimensional scale provided on a lower surface of the stage; a detection unit disposed under the two-dimensional scale and detecting a position of the stage by using the two-dimensional scale; a support body supporting the detection unit; an opening provided on the base plate; a lid body that is provided with the base plate and closes the opening; and a gap that communicates with an upper area and a lower area, wherein the support body is disposed between the lid body and the detection unit so as to be spaced away from the lid body. |
地址 |
Yokohama JP |