| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive type photosensitive composition insensitive to light in the UV region, excellent in sensitivity, chemical resistance and contrast between image and non-image areas as well as in handleability under a white fluorescent lamp and ensuring a sufficient rate of a residual film in the image area, and to provide a positive type photosensitive planographic printing plate. SOLUTION: In the positive type photosensitive composition containing (A) a novolak resin, (B) an acrylic resin and (C) a photothermal conversion material, the acrylic resin is a copolymer containing 1-40 mol% (meth)acrylic acid and a (meth)acrylic ester as copolymerizable components and the weight ratio (%) between the acrylic resin and the novolak resin is in the range of (1-40):(99-60). The positive type photosensitive planographic printing plate is obtained by applying the composition on a base. |
