发明名称 |
Method and apparatus for mixed-mode optical proximity correction |
摘要 |
A semiconductor layout testing and correction system is disclosed. The system combines both rule-based optical proximity correction and model-based optical proximity correction in order to test and correct semiconductor layouts. In a first embodiment, a semiconductor layout is first processed by a rule-based optical proximity correction system and then subsequently processed by a model-based optical proximity correction system. In another embodiment, the system first processes a semiconductor layout with a rule-based optical proximity correction system and then selectively processes difficult features using a model-based optical proximity correction system. In yet another embodiment, the system selectively processes the various features of a semiconductor layout using a rule-based optical proximity correction system or a model-based optical proximity correction system. |
申请公布号 |
AU4328901(A) |
申请公布日期 |
2001.09.12 |
申请号 |
AU20010043289 |
申请日期 |
2001.02.26 |
申请人 |
NUMERICAL TECHNOLOGIES, INC. |
发明人 |
CHRISTOPHE PIERRAT;YOU-PING ZHANG;FANG-CHENG CHANG;HO YONG PARK;YAO-TING WANG |
分类号 |
G03F1/00;G03F1/36;G03F1/70;G06F17/50;H01L21/027 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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