发明名称 METHOD FOR MACHINING LIGHT EMITTING DEVICE WAFER
摘要 The purpose of the present invention is to maintain flatness of a surface in a transparent mold resin layer after turning, to suppress consumption of a cutting unit, and to promote high speed machining when the transparent mold resin of an optical device wafer is turned. According to the present invention, a method for machining an optical device wafer (1) comprises: a first turning process of roughly turning a transparent mold resin (13) of the optical device wafer (1) by applying a cutting tool (43a) to the transparent mold resin (13) while rotating the cutting tool (42a) including a cutting unit formed of a sintered body including diamond; and a second turning process of turning and finishing the transparent mold resin (13) to a desired thickness by applying a cutting tool (43b) while rotating the cutting tool (43b) including a cutting unit including single crystal diamond after the first turning operation.
申请公布号 KR20160068660(A) 申请公布日期 2016.06.15
申请号 KR20150166146 申请日期 2015.11.26
申请人 DISCO CORPORATION 发明人 OSHIMA RYUJI
分类号 H01L33/00;H01L21/02;H01L21/56;H01L21/78 主分类号 H01L33/00
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