发明名称 METHODS FOR FORMING CMOS INVERTERS
摘要 A CMOS inverter is provided. The CMOS inverter includes a substrate. The CMOS inverter also includes an NMOS transistor having a first active region, a first isolation structure surrounding the first active region, a first connect structure, a plurality of the first metal interconnect structure and a first shunted gate structure to educe a delay time and increase a saturation current. Further, the CMOS inverter includes a PMOS transistor having a second active region with a reduced area to reduce the delay time and increase the saturation current, a second isolation structure surrounding the second active region, a second connect structure, a plurality of metal interconnect structure and a second gate structure connecting with the first gate structure through the first connect structure and/or the second connect structure.
申请公布号 US2016260640(A1) 申请公布日期 2016.09.08
申请号 US201615155974 申请日期 2016.05.16
申请人 Semiconductor Manufacturing International (Shanghai) Corporation 发明人 LIN AIMEI;LU JUILIN;WANG YIQI
分类号 H01L21/8238;H01L27/092 主分类号 H01L21/8238
代理机构 代理人
主权项
地址 Shanghai CN