PERIPHERAL ALIGNER AND METHOD FOR EXPOSURE

摘要

PROBLEM TO BE SOLVED: To increase the throughput of even a large substrate relatively easily and at low cost by leading a light beam for exposure onto a photo sensitive substrate by an illumination optical system and increasing the illuminance in an end part of the photo sensitive substrate which is a region where a pattern is not transferred, by means of an optical means. SOLUTION: An illumination light beam emitted by a superhigh pressure mercury lamp 11 disposed at a first focus of an elliptic mirror 12 is reflected on the elliptic mirror 12 to be directed toward a dichroic mirror 13 which reflects only the exposure light to be used as a light beam for exposure. The exposure light reflected on the dichroic mirror 13 forms a light source image at a second focus of the elliptic mirror 12 and then is converted into collimated light by means of a collimator lens 14 to be incident into an optical integrator 15. In order to increase the illuminance in an end part of a photo sensitive substrate 1 along the Y direction which is the direction of a peripheral exposure region EA, a part (specified lens element 50) of a flyeye lens 15 is so structured as to have the prism action at its emission side.