发明名称 |
Nonvolatile capacitor of a semiconductor memory device, and method of operating the same |
摘要 |
The capacitor includes: a lower electrode (40); a dielectric layer (42) stacked on the lower electrode and including a phase-transition layer (42b), which displays two remarkably different resistance characteristics after insulating property thereof is changed; and an upper electrode (44) stacked on the dielectric layer. The dielectric layer may include first and second insulating layers of silicon oxide, tantalum oxide or aluminium oxide for example. The phase-transition layer (42b) may be an oxide of group-V element and preferably is niobium oxide. |
申请公布号 |
EP1544899(A2) |
申请公布日期 |
2005.06.22 |
申请号 |
EP20040257827 |
申请日期 |
2004.12.16 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, JUNG-HYUN;LEE, MYOUNG-JAE;PARK, SUNG-HO;PARK YOUNG-SOO |
分类号 |
H01L27/10;G11C16/02;H01L21/02;H01L21/8242;H01L21/8246;H01L27/115;H01L27/22;H01L29/92;H01L45/00;H01L49/02 |
主分类号 |
H01L27/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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