发明名称 APPARATUS FOR MANUFACTURING CARBON FILM BY PLASMA CVD, METHOD FOR MANUFACTURING THE SAME, AND CARBON FILM
摘要 Provided is a method for uniformly producing a carbon film at a low cost with low power consumption. The method for producing a carbon film, including: a step of disposing a cylindrical member having an opening in part thereof in a vacuum chamber; a step of disposing a substrate inside the cylindrical member; a step of introducing a gas for carbon film production into the vacuum chamber; and a step of applying a voltage for plasma generation to the cylindrical member to thereby generate a plasma in the cylindrical member and to produce the carbon film on the surface of the substrate by the plasma.
申请公布号 EP1834925(A1) 申请公布日期 2007.09.19
申请号 EP20050793094 申请日期 2005.10.13
申请人 DIALIGHT JAPAN CO., LTD. 发明人 HABA, MASANORI
分类号 C01B31/02;C23C16/26;H01J63/06 主分类号 C01B31/02
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