发明名称 |
APPARATUS FOR MANUFACTURING CARBON FILM BY PLASMA CVD, METHOD FOR MANUFACTURING THE SAME, AND CARBON FILM |
摘要 |
Provided is a method for uniformly producing a carbon film at a low cost with low power consumption. The method for producing a carbon film, including: a step of disposing a cylindrical member having an opening in part thereof in a vacuum chamber;
a step of disposing a substrate inside the cylindrical member; a step of introducing a gas for carbon film production into the vacuum chamber; and a step of applying a voltage for plasma generation to the cylindrical member to thereby generate a plasma in the cylindrical member and to produce the carbon film on the surface of the substrate by the plasma.
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申请公布号 |
EP1834925(A1) |
申请公布日期 |
2007.09.19 |
申请号 |
EP20050793094 |
申请日期 |
2005.10.13 |
申请人 |
DIALIGHT JAPAN CO., LTD. |
发明人 |
HABA, MASANORI |
分类号 |
C01B31/02;C23C16/26;H01J63/06 |
主分类号 |
C01B31/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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