发明名称 ASYMMETRIC BIDIRECTIONAL TRANSIENT VOLTAGE SUPPRESSOR AND METHOD OF FORMING SAME
摘要 <p>A bi-directional transient voltage suppression device and a method of making same is provided. The method begins by providing a semiconductor substrate of a first conductivity type, and depositing a first epitaxial layer of a second conductivity type opposite the first conductivity type on the substrate. The substrate and the first epitaxial layer form a first p-n junction. A second epitaxial layer having the second conductivity type is deposited on the first epitaxial layer. The second epitaxial layer has a higher dopant concentration than the first epitaxial layer. A third layer having the first conductivity type is formed on the second epitaxial layer. The second epitaxial layer and the third layer form a second p-n junction.</p>
申请公布号 EP1864318(A2) 申请公布日期 2007.12.12
申请号 EP20060739593 申请日期 2006.03.24
申请人 VISHAY GENERAL SEMICONDUCTOR LLC 发明人 KUNG, PU-JU;HUANG, CHUN-JEN;KAO, LUNG-CHING;PENG, HUNG-JIEU
分类号 H01L29/861;H01L21/20;H01L21/22;H01L21/329;H01L27/02;H01L29/06 主分类号 H01L29/861
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