发明名称 Semiconductor device
摘要 The element electrodes of a semiconductor element are disposed in a cell region, while an outermost peripheral electrode electrically connected to a semiconductor substrate is disposed in a peripheral region. In the peripheral region, a second-conductivity-type layer is disposed above a super-junction structure. A potential division region is disposed above the second-conductivity-type layer to electrically connect the element electrodes and the outermost peripheral electrode and also divide the voltage between the element electrodes and the outermost peripheral electrode into a plurality of stages. A part of the potential division region overlaps the peripheral region when viewed from the thickness direction of the semiconductor substrate.
申请公布号 US9478621(B2) 申请公布日期 2016.10.25
申请号 US201214238915 申请日期 2012.09.04
申请人 DENSO CORPORATION 发明人 Akagi Nozomu;Kagata Yuma;Kuwahara Makoto
分类号 H01L29/66;H01L29/40;H01L29/78;H01L29/06;H01L29/08 主分类号 H01L29/66
代理机构 Posz Law Group, PLC 代理人 Posz Law Group, PLC
主权项 1. A semiconductor device including a cell region and a peripheral region surrounding the cell region, the semiconductor device comprising: a semiconductor substrate including a first-conductivity-type layer, and first-conductivity-type column regions and second-conductivity-type column regions formed above the first-conductivity-type layer and serving as a drift region, the first-conductivity-type column regions and the second-conductivity-type column regions forming a super-junction structure, each of the first-conductivity-type column regions having a first-conductivity-type impurity concentration per unit volume, each of the second-conductivity-type column regions having a second-conductivity-type impurity concentration per unit volume, a part of the semiconductor substrate being included in the cell region and other part of the semiconductor substrate being included in the peripheral region; a semiconductor element disposed in the cell region; an element electrode of the semiconductor element disposed in the cell region; an outermost peripheral electrode electrically connected to the semiconductor substrate in the peripheral region; a second-conductivity-type layer formed above the super-junction structure in the peripheral region; and a potential division region formed above the second-conductivity-type layer to electrically connect the element electrode to the outermost peripheral electrode and also divide a voltage between the element electrode and the outermost peripheral electrode into a plurality of stages, a part of the potential division region overlapping the peripheral region when viewed from a thickness direction of the semiconductor substrate, wherein the peripheral region further includes a charge balance change region in which a difference between the first-conductivity-type impurity concentration and the second-conductivity-type impurity concentration of one section of the charge balance change region is larger than a difference between the first-conductivity-type impurity concentration and the second-conductivity-type impurity concentration of another section of the charge balance change region, the one section being located farther from the cell region than the another section in the peripheral region.
地址 Kariya JP