EXPOSURE MASK BLANK, EXPOSURE MASK AND COLOR FILTER

摘要

PROBLEM TO BE SOLVED: To provide an exposure mask blank which prevents an ITO film as a semi-transmitting film from being worn in a process of patterning a light-shielding film.

SOLUTION: The exposure mask blank has an etching stopper film between an ITO semitransmitting film and a light-shielding film. In constitution of the present invention, since the etching stopper film having durability against etching of the light-shielding film is formed, the ITO semitransmitting film can be prevented from being worn during etching the light-shielding film.

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