发明名称 |
Lithographic photoresist composition and process for its use in the manufacture of integrated circuits |
摘要 |
A novel radiation-sensitive lithographic photoresist composition is provided which has improved sensitivity and resolution. The composition comprises a photosensitive acid generator and an acrylate or methacrylate copolymer. The copolymer contains first monomeric units having polar pendant groups and second monomeric units containing photoacid-cleavable ester groups. The polar pendant groups preferably comprise C6-C12 alicyclic substituents containing a polar moiety R*, wherein the alicyclic substituents are bound through a linker moiety to the polymer backbone. Other monomeric units may be included as well. A process for using the composition to generate resist images on a substrate, i.e., in the manufacture of integrated circuits or the like.
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申请公布号 |
US6165678(A) |
申请公布日期 |
2000.12.26 |
申请号 |
US19980111558 |
申请日期 |
1998.07.08 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ALLEN, ROBERT DAVID;DIPIETRO, RICHARD ANTHONY;SOORIYAKUMARAN, RATNAM;WALLOW, THOMAS I.;WALLRAFF, GREGORY MICHAEL |
分类号 |
G03F7/004;G03F7/039;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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