发明名称 Methods for measuring a thickness of an object
摘要 A method for analyzing an object includes measuring a first reflectivity of light from a surface and measuring a second reflectivity of light from the object, after the object is formed on the surface. A variation between the first and second reflectivities is calculated, and the variation is transformed by a predetermined transform. A thickness of the object is determined based on the transformed variation.
申请公布号 US9360308(B2) 申请公布日期 2016.06.07
申请号 US201414248673 申请日期 2014.04.09
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 Hwang Byung Hyun;Kim Kwang-Hoon;Son Woongkyu;Song Chulgi;Leem Choonshik
分类号 G01N23/20;G01B15/02 主分类号 G01N23/20
代理机构 Lee & Morse, P.C. 代理人 Lee & Morse, P.C.
主权项 1. A method for analyzing an object, the method comprising: measuring a first X-ray reflectivity from a substrate before formation of the object, measuring the first X-ray reflectivity including measuring a first X-ray reflectivity spectrum; forming the object on the substrate; measuring a second X-ray reflectivity from the substrate after the formation of the object, measuring the second X-ray reflectivity includes measuring a second X-ray reflectivity spectrum; generating a delta spectrum between the first and second X-ray reflectivity spectrums, the delta spectrum corresponding to a variation between the first and second X-ray reflectivities; transforming the variation using a fast-Fourier transform; and determining a thickness of the object based on the transformed variation.
地址 Suwon-si, Gyeonggi-do KR