发明名称 |
Methods for measuring a thickness of an object |
摘要 |
A method for analyzing an object includes measuring a first reflectivity of light from a surface and measuring a second reflectivity of light from the object, after the object is formed on the surface. A variation between the first and second reflectivities is calculated, and the variation is transformed by a predetermined transform. A thickness of the object is determined based on the transformed variation. |
申请公布号 |
US9360308(B2) |
申请公布日期 |
2016.06.07 |
申请号 |
US201414248673 |
申请日期 |
2014.04.09 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
Hwang Byung Hyun;Kim Kwang-Hoon;Son Woongkyu;Song Chulgi;Leem Choonshik |
分类号 |
G01N23/20;G01B15/02 |
主分类号 |
G01N23/20 |
代理机构 |
Lee & Morse, P.C. |
代理人 |
Lee & Morse, P.C. |
主权项 |
1. A method for analyzing an object, the method comprising:
measuring a first X-ray reflectivity from a substrate before formation of the object, measuring the first X-ray reflectivity including measuring a first X-ray reflectivity spectrum; forming the object on the substrate; measuring a second X-ray reflectivity from the substrate after the formation of the object, measuring the second X-ray reflectivity includes measuring a second X-ray reflectivity spectrum; generating a delta spectrum between the first and second X-ray reflectivity spectrums, the delta spectrum corresponding to a variation between the first and second X-ray reflectivities; transforming the variation using a fast-Fourier transform; and determining a thickness of the object based on the transformed variation. |
地址 |
Suwon-si, Gyeonggi-do KR |