| 摘要 |
The invention relates to a device and method for wave front measuring of an optical reproduction system and microlithographic projection illumination system. The invention also relates to a device and a method for wave front measuring of an optical reproduction system (5) and to a microlithographic projection illumination system which is equipped with said type of device. The invention is characterised in that the device comprises a wave front generation unit comprising an optical element (1) having a periodic structure on the object side, and a light source unit which is used to illuminate the object-sided periodic structure with measuring radiation, in addition to a detector unit which is associated with the image side of the reproduction system which is to be measured. Said detector unit comprises an optical element (3) provided with a periodic structure (4) on the image side, and a detector element which is used to detect a superimposed model of the periodic structure formed on the object side and the periodic structure on the image side. The wave front generation unit is provided for limiting the angle spectrum (6) of the measuring radiation leading from the respective field points (7) in such a manner that the measuring radiation leading from the respective field points illuminates only one specific partial area (8) of a pupil plane (9) of the optical reproduction system. The invention also relates to the use of said device, for example, for wave front measuring microlithographic projection objectives. |
