发明名称 |
WAFER SUPPORTING DEVICE OF A SPUTTERING APPARATUS |
摘要 |
A wafer supporting device of a sputter apparatus includes a pedestal positioned in a sputtering chamber and used to load a wafer for sputtering, a deposition ring having a recess positioned on a peripheral portion of the pedestal, and a cover ring positioned on the pedestal and the deposition ring. The cover ring has a gate corresponding to the recess.
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申请公布号 |
US2008317564(A1) |
申请公布日期 |
2008.12.25 |
申请号 |
US20070768192 |
申请日期 |
2007.06.25 |
申请人 |
CHENG CHI-PIAO;LIANG LI-CHUN;HUANG YU-JEN;CHEN BEEN |
发明人 |
CHENG CHI-PIAO;LIANG LI-CHUN;HUANG YU-JEN;CHEN BEEN |
分类号 |
B65G49/07 |
主分类号 |
B65G49/07 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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