| 主权项 |
1. A substrate processing method for use with a substrate processing apparatus, the substrate processing apparatus comprising: a processing chamber, a processing gas supply unit for supplying a processing gas into the processing chamber, and a gas exhaust unit for exhausting the processing chamber, wherein the gas exhaust unit comprises a turbo molecular pump and an automatic pressure control valve, the method comprising:
loading a substrate into the processing chamber; processing the substrate by supplying the processing gas into the processing chamber and causing the processing gas to react on the substrate in the processing chamber, wherein during said processing the substrate, by-products having larger molecular masses than the processing gas are generated; and controlling, during said processing the substrate, a processing uniformity by setting a revolution speed of the turbo molecular pump to a lower level than a maximum level while maintaining a pressure in the processing chamber to a predetermined level by controlling a gas exhaust amount using the automatic pressure control valve, wherein by said controlling the processing uniformity, a partial pressure of the by-products during said processing the substrate is lower than that in a case where the revolution speed of the turbo molecular pump is set to the maximum level while maintaining the pressure in the processing chamber to the predetermined level by controlling the gas exhaust amount using the automatic pressure control valve, so that the processing uniformity is improved during said processing the substrate. |
