APPARATUS AND METHOD FOR PROFILING A BEAM OF A LIGHT EMITTING SEMICONDUCTOR DEVICE

摘要

Methods and apparatus (100) for profiling a beam of a light emitting semiconductor device. The apparatus comprises a light emitting semiconductor device (102) comprising an active region (108) formed on a substrate (104) and configured to generate light when a suitable electrical current is applied to contacts on an upper surface of the device and a light emitting surface (110) defined by a lower surface of the substrate opposite the contacts. The apparatus further comprises a transmission medium (112) comprising a first surface (114) in contact with at least part of the light emitting surface of the semiconductor device and a diffusion surface (116), opposite the first surface, and configured to diffuse light emitted from the micro-LED and transmitted through the transmission medium.

主权项

1. An apparatus for profiling a beam of a light emitting semiconductor device, comprising:
a light emitting semiconductor device comprising an active region formed on a substrate and configured to generate light when a suitable electrical current is applied to contacts on an upper surface of the device, and a light emitting surface defined by a lower surface of the substrate opposite the contacts; and a transmission medium comprising a first surface in contact with at least part of the light emitting surface of the semiconductor device and a diffusion surface, opposite the first surface, and configured to diffuse light emitted from the semiconductor device and transmitted through the transmission medium.