| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition with which a pattern having excellent line width roughness(LWR) can be obtained. <P>SOLUTION: A resist composition comprises: a polymer having a structural unit expressed by the formula(I); a resin which has an acid labile group, and which is insoluble or hardly soluble in an alkali aqueous solution and can become soluble in an alkali aqueous solution by an action of an acid; and an acid generator. <P>COPYRIGHT: (C)2012,JPO&INPIT |
