发明名称 SYSTEM AND METHOD FOR FORMING GAS HYDRATES
摘要 A system for forming gas hydrates includes a reactor adapted to receive a hydrate-forming fluid and a reaction fluid and react the hydrate-forming and reaction fluids within a reverse micellar solution to form gas hydrate particles; and a gas hydrate removal system coupled to the reactor, the gas hydrate removal system adapted to receive the gas hydrate particles within the reverse micellar solution and transport the gas hydrate particles away from the reactor. The gas hydrate removal system is adapted to transport gas hydrate particles away from the reactor concurrently with the formation of gas hydrate particles within the reactor.
申请公布号 US2007203374(A1) 申请公布日期 2007.08.30
申请号 US20070679705 申请日期 2007.02.27
申请人 SUNG IL. CO., LTD. (SIM) 发明人 WOO YANG-HO;WOO TA-KWAN
分类号 B01J8/00;C07C9/00 主分类号 B01J8/00
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