Chemical vapor deposition process for depositing a silica coating on a glass substrate

摘要

A CVD process for depositing a silica coating is provided. The process includes providing a glass substrate. The process also includes forming a gaseous mixture including a silane compound, oxygen, a fluorine-containing compound, and a radical scavenger such as ethylene or propylene. The gaseous mixture is directed toward and along the glass substrate and is reacted over the glass substrate to form the silica coating thereon.

主权项

1. A chemical vapor deposition process for depositing a silica coating, comprising:
providing a float glass ribbon in a float glass manufacturing process; forming a gaseous mixture comprising a silane compound, oxygen, a fluorine-containing compound, and a radical scavenger; and directing the gaseous mixture toward and along the float glass ribbon, and reacting the mixture over the float glass ribbon to form the silica coating thereon, wherein the silica coating is undoped.