摘要 |
<p>Apparatus and method for simultaneous interferometric measurements of angular orientation of and distance to a plane mirror (70) measurement object using a multiple beam (12) interferometer system. A first and second group of the multiple beam interferometer systems have beams that contact the measurement object two times and three times, respectively, for simultaneous measurement of one or more of changes in the distance to and changes of the angular orientation in one plane or in two orthogonal planes of the measurement object.</p> |