发明名称 Gallium nitride power devices using island topography
摘要 A semiconductor device in provided having a substrate and a semiconductor layer formed on a main surface of the substrate. A plurality of first island electrodes and a plurality of second island electrodes are placed over the semiconductor layer. The plurality of first island electrodes and second island electrodes are spaced apart from each other so as to be alternatively arranged to produce two-dimensional active regions in all feasible areas of the semiconductor layer. Each side of the first island electrodes is opposite a side of the second island electrodes. The semiconductor device can also include a plurality of strip electrodes that are formed in the regions between the first island electrodes and the second island electrodes. The strip electrodes serve as the gate electrodes of a multi-island transistor. The first island electrodes serve as the source electrodes of the multi-island transistor. The second island electrodes serve as the drain electrodes of the multi-island transistor. A plurality of connections to the gate electrodes are provided at each interstice defined by corners of the first island electrodes and the second island electrodes.
申请公布号 US9508797(B2) 申请公布日期 2016.11.29
申请号 US201514681676 申请日期 2015.04.08
申请人 GAN SYSTEMS INC. 发明人 Roberts John;Mizan Ahmad;Patterson Girvan;Klowak Greg
分类号 H01L29/41;H01L29/06;H01L29/20;H01L29/417;H01L29/423;H01L23/528;H01L23/00;H01L29/778;H01L29/47;H01L29/205 主分类号 H01L29/41
代理机构 代理人
主权项 1. A nitride semiconductor device comprising: a substrate; a nitride semiconductor layer comprising a nitride semiconductor hetero-layer formed on a main surface of the substrate; a plurality of source island electrodes and a plurality of drain island electrodes of a multi-island transistor formed on the nitride semiconductor layer, the source island electrodes and drain island electrodes being spaced apart from each other and arranged as an array with alternating source island electrodes and drain island electrodes along at least two different axial directions to produce two-dimensional active regions in a device area of the nitride semiconductor layer; a plurality of gate strip electrodes formed on the nitride semiconductor layer in active regions between adjacent source island electrodes and drain island electrodes, an overlying low resistance gate interconnect running between the source island electrodes and drain island electrodes, the plurality of gate electrodes being interconnected to the low resistance gate interconnect by gate interconnections at interstices defined by adjacent vertices of the source island electrodes and the drain island electrodes; each of the plurality of source island electrodes having a respective individual source contact area (pad) comprising a bump, ball or post connection formed thereon; each of the plurality of drain island electrodes having a respective individual drain contact area (pad) comprising a bump, ball or post connection formed thereon; the low resistance gate interconnect being connected to a plurality of gate pads; and wherein, in defective active regions, individual gate strip electrodes are selectively disconnected from the gate interconnect by absence or removal of respective gate interconnections thereto.
地址 Ottawa CA