| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition giving a large solubility contrast regardless of species of polymer precursors, particularly, polyimide precursors, and thereby, obtaining a pattern with a preferable feature while keeping a sufficient process margin. <P>SOLUTION: The photosensitive resin composition contains a salt of a carboxylic acid causing photo-decarboxylation and an amine, and a polymer precursor. One example of the salt is a salt of an amine and a carboxylic acid containing an aromatic component expressed by formula (1), wherein each of R<SP>1</SP>to R<SP>10</SP>independently represents a hydrogen atom or a monovalent organic group. <P>COPYRIGHT: (C)2007,JPO&INPIT |
