| 摘要 |
The invention concerns an illumination system of a microlithographic projection exposure apparatus comprising a mirror arrangement (21, 43, 45, 52, 63, 84, 93, 140, 250, 340, 540, 940) which has a plurality of mirror units (141, 142, 143, 341, 342, 343, 541, 542, 543), wherein said mirror units are displaceable independently of each other for altering an angle distribution of the light reflected by the mirror arrangement (21, 43, 45, 52, 63, 84, 93, 140, 250, 340, 540, 940), and at least one birefringent element (20, 42a, 44, 51, 62, 64, 71, 81, 91, 130, 200, 260, 330, 530, 930) arranged in front of the mirror arrangement (21, 43, 45, 52, 63, 84, 93, 140, 250, 340, 540, 940) in the light propagation direction for producing at least two different states of polarization incident on different mirror units or on different mirror elements of the same mirror unit. |
