发明名称 MECHANICAL STRESS MEASUREMENT DURING THIN-FILM FABRICATION
摘要 A method and system are provided for determining mechanical stress experienced by a film during fabrication thereof on a substrate positioned in a vacuum deposition chamber. The substrate' s first surface is disposed to have the film deposited thereon and the substrate's opposing second surface is a specular reflective surface. A portion of the substrate is supported. An optical displacement sensor is positioned in the vacuum deposition chamber in a spaced-apart relationship with respect to a portion of the substrate's second surface. During film deposition on the substrate' s first surface, displacement of the portion of the substrate' s second surface is measured using the optical displacement sensor. The measured displacement is indicative of a radius of curvature of the substrate, and the radius of curvature is indicative of mechanical stress being experienced by the film.
申请公布号 WO2016144801(A1) 申请公布日期 2016.09.15
申请号 WO2016US20999 申请日期 2016.03.04
申请人 UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF THE NATIONAL AERONAUTICS & SPACE ADMINISTRATION 发明人 BROADWAY, David, M.
分类号 G01N21/95 主分类号 G01N21/95
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