| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a MEMS including an environment that is controlled or controllable for the proper, improved, and/or optimum movement of a mechanical structure. <P>SOLUTION: A method includes steps of: depositing a sacrifice layer on at least part of the mechanical structure; depositing a first sealing layer on the sacrifice layer; forming at least one vent by penetrating the first sealing layer so as to expose at least part of the sacrifice layer; removing the at least part of the sacrifice layer to form a chamber; introducing at least a sort of relatively stable gas into the chamber; and depositing a second sealing layer on or at least in one vent to thereby seal the chamber where the second sealing layer is a semiconductor material. <P>COPYRIGHT: (C)2012,JPO&INPIT |
