发明名称 COMPOSITION FOR CONJUGATE, CONJUGATE STRUCTURE AND MANUFACTURING METHOD OF CONJUGATE STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a composition for conjugation and a conjugation structure capable of enhancing conjugation reliability of first and second conjugation target members after conjugation and controlling interval between the first and second conjugation target members with high accuracy.SOLUTION: A composition for conjugation is used for conjugating a first conjugation target member 2 and a second conjugation target members 3 and 4 by a sintered article of metal atom-containing particles. The composition for conjugation contains a conjugation material containing a metal atom-containing particle and a conductive particle 21 having CV value of a particle diameter of 10% or less. The conductive particle 21 has base material particles and a conductive layer arranged on a surface of the base material particles.SELECTED DRAWING: Figure 1
申请公布号 JP2016195126(A) 申请公布日期 2016.11.17
申请号 JP20160131603 申请日期 2016.07.01
申请人 SEKISUI CHEM CO LTD 发明人 UENOYAMA SHINYA
分类号 H01B1/22;B22F1/00;B22F7/08;B23K35/34;H01B1/00 主分类号 H01B1/22
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