Microelectronic substrate retainer apparatus providing reduced microelectronic substrate damage

摘要

An apparatus for attenuating physical damage to a substrate, along with an attendant method, comprises as a first component a base plate having defined therein a location for receiving a substrate cassette. The apparatus also comprises a substrate retainer movably attached to the base plate such that when the substrate cassette having a substrate contained therein is positioned on the base plate at the location for receiving the substrate cassette, and the substrate is subjected to a mechanical force, the substrate retainer moves such as to retain the substrate within the substrate cassette with a retaining force. Both the apparatus and the method are particularly applicable for attenuating damage to a substrate when spin-drying the substrate.